modeling of manufacturing of field-effect heterotransistors without p-n-junctions to optimize decreasing their dimensions

it has been recently shown that manufacturing p-n-junctions, field-effect and bipolar transistors, thyristors in a multilayer structure by diffusion or ion implantation with the optimization of dopant and/or radiation defects leads to increase the sharpness of p-n-junctions (both single p-n-junctions and p-n-junctions framework their system). due to the optimization, one can also obtain increasing of homogeneity of dopant in doped area. in this paper, we consider manufacturing of a field-effect heterotransistor without p-njunction. framework the approach of manufacturing, we consider a heterostructure with specific configuration, doping required parts of the heterostructure by dopant diffusion or by ion implantation and optimization of annealing of dopant and/or radiation defects. the optimization gives us possibility to decrease dimensions of field-effect transistors. we introduce an analytical approach to model technological processes without crosslinking concentrations of dopant and radiation defects on interfaces between layers of heterostructure.